News & Events
Location: Amsterdam, Netherlands
Date: 12-13 November, 2018
We are pleased to announce LEELIS-III, a unique platform to focus on the role of low-energy electrons in imaging and nanolithography. While low-energy electrons play a key role in very diverse processes, ranging from radiology to astrochemistry, they are of particular importance for industrial extreme ultraviolet lithography (EUVL) and low-energy electron microscopy (LEEM). In both these examples, sensitive material (photoresists, soft matter) is exposed to ionizing radiation and low-energy electrons. However, we know little of how low-energy electrons propagate in different materials, or how they induce chemical reactions. Filling this knowledge gap is essential for moving EUVL and LEEM forward, and particularly for pushing lithography to its physical limits.
ELENA 2nd TRAINING SCHOOL
Location: Brno, The Czech Republic
Date: 27-30 August, 2018
The 2nd ELENA Project Technical Training School will be held in Brno (CZ). TESCAN is hosting and partner CEI-Europe is organizing the school. The training school will focus on EUVL and other (related) lithography methods including problematic and approaches in wafer production.
Location: Modena, Italy
Date: 10-13 July, 2018
It follows the editions of 2006 in Delft (NL), 2008 in Thun (CH), 2010 in Albany (US), 2012 in Saragoza (ES), 2014 in Frankfurt (DE) and 2016 in Vienna (AT). The workshop is organized by the Nanoscience Institute of National Research Council (CNR), Modena S3. The city of Modena, with its Romanesque architecture masterpiece, the renowned food excellence and the birthplace of Ferrari cars’ myth, is looking forward to welcoming you!