Publications

Metals by Micro‐Scale Additive Manufacturing: Comparison of Microstructure and Mechanical Properties

Alain Reiser, Lukas Koch, Kathleen A. Dunn, Toshiki Matsuura, Futoshi Iwata, Ofer Fogel, Zvi Kotler, Nanjia Zhou, Kristin Charipar, Alberto Piqué, Patrik Rohner, Dimos Poulikakos, Sanghyeon Lee, Seung Kwon Seol, Ivo Utke, Cathelijn van Nisselroy, Tomaso Zambelli, Jeffrey M. Wheeler, Ralph Spolenak

Micro‐Scale Additive Manufacturing: Comparison of Microstructure and Mechanical Properties. Adv. Funct. Mater. 2020, 1910491. https://doi.org/10.1002/adfm.201910491

 

Mechanical Properties of 3D Nanostructures Obtained by Focused Electron/Ion Beam-Induced Deposition: A Review​

Ivo Utke, Johann Michler, Robert Winkler and Harald Plank

Micromachines 2020, 11(4), 397; https://doi.org/10.3390/mi11040397

 

Cisplatin as Potential Pt FEBID Precursor: NH3 Ligands Enhance the Electron-Induced Removal of Chlorine

M. Rohdenburg, P. Martinovic, K. Ahlenhoff, S. Koch, D. Emmrich, A. Gölzhäuser, P. Swiderek

J. Phys. Chem. C 123, 21774-21787 (2019) https://doi.org/10.1021/acs.jpcc.9b05756

 

Rapid Water Permeation Through Carbon Nanomembranes with Sub-Nanometer Channels

Yang Yang, Petr Dementyev, Niklas Biere, Daniel Emmrich, Patrick Stohmann, Riko Korzetz, Xianghui Zhang, André Beyer, Sascha Koch, Dario Anselmetti, Armin Gölzhäuser

ACS Nano, Vol. 12, p. 4695, 2018, pp 4695–4701. https://doi.org/10.1021/acsnano.8b01266

 

Towards the third dimension in direct electron beam writing of silver

Katja Höflich, Jakub Mateusz Jurczyk, Katarzyna Madajska, Maximilian Götz, Luisa Berger, Carlos Guerra-Nuñez, Caspar Haverkamp, Iwona Szymanska and Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849. https://doi.org/10.3762/bjnano.9.78

 

Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

Ziyan Warneke, Markus Rohdenburg, Jonas Warneke, Janina Kopyra and Petra Swiderek

Beilstein J. Nanotechnol. 2018, 9, 77–90. https://doi.org/10.3762/bjnano.9.10

 

Unraveling the role of photons and electrons upon their chemical interaction with photoresist during EUV exposure

Yannick Vesters, Ashish Rathore, Pieter Vanelderen, John Petersen, Danilo De Simone, Geert Vandenberghe, Ivan Pollentier

Proceedings Volume 10586, Advances in Patterning Materials and Processes XXXV; 105860C (2018) https://doi.org/10.1117/12.2299593

 

Surface-Anchored Metal–Organic Frameworks as Versatile Resists for Gas-Assisted E-Beam Lithography: Fabrication of Sub-10 Nanometer Structures

M. Drost, F. Tu, L. Berger, C. Preischl, W. Zhou, H. Gliemann, C. Wöll  and H. Marbach

ACS Nano, 2018, 12 (4), pp 3825–3835 ​https://doi.org/10.1021/acsnano.8b01071

 

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